In the Spotlight PRESENTATION ON WASTEWATER TREATMENT IN PHOTOVOLTAICS, July 17, 2008  Dr. Vivien Krygier, Senior Vice President of Marketing, Pall Corporation, will be giving a presentation on waste treatment in photovoltaics at the Solar Materials, Equipment and Technology Conference (SMET) in San Francisco. She will be speaking about Pall's silicon recovery treatment system and blowback system for crystal ingot pullers. The presentation will be based on the paper, "Waste Treatment in Photovoltaics" by Vivien Krygier, PhD (Pall Corporation, USA) and Rolf Berndt,  Prof. Dr.-Ing. (Pall GmbH, Germany). New Article!  Trace Metal Ion Removal from Point-of-Use Ultrapure Water in the Semiconductor Industry NEW GUIDE! Filtration Selection Guide for Digital Printing Systems  NEW GUIDE! Selecting Filtration for Ink Jet Ink Formulation and its reference chart, Filtration Products for Ink Jet Ink Formulation Pall's Newest PE-Kleen Filter Brings the Tightest Rated Filter to Advanced Lithography Applications New Pall Excellar ER Filter with Enhanced Retention Design Broaches 20 Nanometer Level to Enable Next Technology Node Wet Cleaning Pall Microelectronics Helps Chip Manufacturers Improve Productivity With New Generation Filter for Wet Chemistry Processes

READ PALL PRESS RELEASES Solar Applications Semiconductor Applications FEATURED PRODUCTS Solar Applications New! Microfiltration Water Recovery System New! Gaskleen®  Light Series Filter Assemblies New! PSS® PV Filter and Filter Housing Gaskleen Purifiers with Areskleen™ INP Medium Gaskleen Purifiers with Areskleen™ SIP Medium Chemical Applications New! FlexBowl™ Filter Vessel System New! UltiKleen™ SPM Kleen-Change® Assemblies New! UltiKleen™ SPM G2 Kleen-Change® Assemblies Gas Applications New! Corrosive Gas Purification Materials for HCI and HBr Service Microlithography Applications New! PhotoKleen™ EZD-3X Filter New! 10 nm Asymmetric P-Nylon Filter 20 nm Asymmetric P-Nylon Filter CMP Applications CMPure CMPD Series Filters

Faced with ever-increasing pressure to maximize production yields in order to compete in world markets, today's microelectronics firms are also challenged with the demand to produce devices with greater memory, faster speeds and reduced size.

The dilemma to achieve greater production yields and greater product performance in the face of shrinking device geometries has intensified the need for filtration at every stage of semiconductor fabrication. For over fifty years, Pall Corporation has continued to set the standard in filtration and separations technology. We have applied that standard to the purification and filtration of fluids and gases used in the semiconductor fabrication process, including chemical, water, gas and photoresist applications.

Because of Pall's extensive knowledge of the semiconductor fabrication process and the company's history of innovation and advanced scientific laboratory services, customers around the globe can depend on Pall to provide the best solutions to the toughest fluid clarification problems.

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